US lawmakers seek to block China’s DUV lithography access

A group of bipartisan lawmakers in the United States has introduced legislation to tighten restrictions on advanced semiconductor manufacturing equipment, seeking to block Chinese chipmakers from accessing deep-ultraviolet (DUV) immersion lithography systems, as well as related parts and maintenance services. The Multilateral Alignment of Technology Controls on Hardware (MATCH) Act is designed to coordinate export […] The post US lawmakers seek to block China’s DUV lithography access appeared first on Asia Times .

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